Plasma properties of a hydrocarbon arcjet used in the plasma deposition of diamond thin films
- 15 December 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (12) , 6187-6190
- https://doi.org/10.1063/1.346909
Abstract
Plasma-deposited thin films of polycrystalline diamond were achieved with an arcjet plasma. The jet operated with hydrogen gas with small admixtures of CH4. The diamond films were highly nonuniform, probably due to the very high gradients of the chemical species and temperatures within the arcjet-substrate system. The arcjet apparatus, and optical emission spectra and Langmuir probe diagnostics of the plasma are described. Also presented are results for the surface chemical analysis of the diamond film using surface analysis by laser ionization.This publication has 4 references indexed in Scilit:
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- Nonresonant multiphoton ionization as a sensitive detector of surface concentrations and evaporation ratesApplied Physics Letters, 1984
- Vapor Deposition of Diamond Particles from MethaneJapanese Journal of Applied Physics, 1982