The effect of substrate bias on the electrical and optical properties of In2O3 films grown by RF sputtering
- 16 May 1978
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 47 (1) , 329-337
- https://doi.org/10.1002/pssa.2210470139
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
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