Thermochromism of metal-doped VO2 films deposited by dual-target sputtering
- 9 September 1994
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 2255, 415-423
- https://doi.org/10.1117/12.185384
Abstract
Thermochromic VO2 films were prepared by reactive magnetron sputtering under various conditions of substrate temperature, total sputter pressure and oxygen flow ratio and characterized by XRD, RBS, AFM and spectrophotometry. Films with VO2 single phase were formed from a fairly low substrate temperature of 300 degree(s)C by precisely controlling the oxygen flow ratio. The use of vanadium-nucleated substrates significantly improved the crystallinity of VO2. Tungsten doped V1-xWxO2 films with x equals 0 approximately 0.26 were formed by dual-target sputtering and the thermochromism of films was evaluated. The tungsten doping linearly hysteresis loop width.Keywords
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