InP Etchant for Submicron Patterns
- 1 December 1986
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 133 (12) , 2485-2491
- https://doi.org/10.1149/1.2108455
Abstract
A new chemical etching solution, saturated bromine water , has been developed for fabricating submicron patterns on and crystal surfaces. The fundamental characteristics, such as etching profiles, depth‐to‐undercutting etching ratio, and solution stability, are studied using an AZ photoresist mask. The composition of is found to be suitable for the fabrication of an optical grating on and crystals. This new etchant permits the fabrication of high performance distributed feedback laser diodes at wavelengths near 1.3 and 1.5 μm.Keywords
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