Electrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 233-240
- https://doi.org/10.1016/0167-9317(87)90043-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Radiation damage effects in boron nitride mask membranes subjected to x-ray exposuresJournal of Vacuum Science & Technology B, 1987
- Low pressure chemical vapor deposition boro-hydro-nitride films and their use in x-ray masksJournal of Vacuum Science & Technology B, 1986