Gas Analysis in an r.f. Sputtering Plant

Publisher Website

1 February 1973

journal article
Published by Springer Nature in Nature Physical Science

Vol. 241 (112) , 149-151
https://doi.org/10.1038/physci241149a0

Abstract

No abstract available

Keywords

This publication has 2 references indexed in Scilit:

The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—I. Target processes
Vacuum, 1972
Getter Sputtering for the Preparation of Thin Films of Superconducting Elements and Compounds
Journal of Applied Physics, 1964