ELECTRICAL RESISTIVITY MODEL FOR POLYCRYSTALLINE FILMS: THE CASE OF SPECULAR REFLECTION AT EXTERNAL SURFACES
- 1 June 1969
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 14 (11) , 345-347
- https://doi.org/10.1063/1.1652680
Abstract
A model is developed for estimating effects due to electron scattering from grain boundaries, occurring simultaneously with background scattering. Since grain-boundary effects are negligible in bulk materials, the model is particularly relevant to polycrystalline metal films in which a very fine-grained structure is often found. It is shown by solution of the appropriate Boltzmann equation, that the total resistivity can be strongly dominated by grain-boundary scattering. If grain size increases with film thickness, a marked dependence of resistivity on thickness exists, even when scattering from external surfaces is negligible or is completely specular.Keywords
This publication has 3 references indexed in Scilit:
- Intrinsic Resistivity and Electron Mean Free Path in Aluminum FilmsJournal of Applied Physics, 1968
- Perpendicular Anisotropy in Polycrystalline Ni-Fe Thin FilmsJournal of Applied Physics, 1966
- The mean free path of electrons in metalsAdvances in Physics, 1952