Surface Morphology and Line Fill Properties of Gold Grown by Organometallic Chemical Vapor Deposition
- 1 December 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (12S) , 4403-4406
- https://doi.org/10.1143/jjap.31.4403
Abstract
Dimethyl gold hexafluoroacetylacetonate, (DMAu(hfac)) was used to grow gold films by thermal decomposition. We found that surface morphology and line fill properties greatly depend on the substrate temperature and reactor pressure. Under optimum growth conditions, we have obtained gold films with flat surfaces and fine line fillings. We propose a growth model to explain the variation in surface morphology at various growth temperatures and reactor pressures.Keywords
This publication has 2 references indexed in Scilit:
- Chemical Vapor Deposition of GoldJournal of the Electrochemical Society, 1987
- Deposition of GaAs Epitaxial Layers by Organometallic CVD: Temperature and Orientation DependenceJournal of the Electrochemical Society, 1983