Distortion of depth profiles during sputtering
- 1 January 1980
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 168 (1-3) , 389-394
- https://doi.org/10.1016/0029-554x(80)91281-1
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Small-angle multiple scattering of ions in the screened Coulomb region: I. Angular distributionsPublished by Elsevier ,2002
- A theoretical treatment of cascade mixing in depth profiling by sputteringPhysics Letters A, 1979
- The depth resolution of sputter profilingApplied Physics A, 1979
- ErratumNuclear Instruments and Methods, 1975
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- The theory of recoil implantationRadiation Effects, 1969
- Sputtering and depth-distribution phenomena in KCl, Al2O3, and TiO2Canadian Journal of Physics, 1968
- Super ranges of fast ions in copper single crystalsPhysics Letters, 1963
- Das allgemeine Fehlergesetz, die Schwankungen der Feldst rke in einem Dielektrikum und die Zerstreuung der?-StrahlenThe European Physical Journal A, 1921