Influence of deposition conditions and film thickness on the 〈001〉 orientation of erbium films
- 1 January 1992
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 63 (1) , 1494-1496
- https://doi.org/10.1063/1.1143001
Abstract
The influences of substrate temperature, deposition rate and film thickness on the structure of erbium films deposited on molybdenum substrates of surface roughness Rq=151 nm are investigated by energy-dispersive x-ray diffraction. This shows that erbium polycrystalline films grow preferentially in the 〈001〉 direction. The intensity ratio of the Er(002) peak to Er(101) increases with film thickness, in particular above 300 nm thickness. The influence of direction of the incident evaporated beam at 8.5° to the normal is also investigated and it is shown that at low substrate temperature the film orientation is offset, but at higher temperatures (Ts≥575 K) the film orientation becomes normal to the substrate. Such controllable preferred orientation may be of value in the fabrication of diffracting components for x-ray instrumentation.Keywords
This publication has 1 reference indexed in Scilit:
- Energy-dispersive powder diffraction at the SRSNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1989