Kinetics of Epitaxial Silicon Deposition by a Low Pressure Iodide Process

• 1 January 1965
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 112  (7) , 710
• https://doi.org/10.1149/1.2423671

Abstract

Keywords

• KINETICS
• LOW PRESSURE