Growth of TiO2 Rutile Films at Low Temperature by Reactive Sputtering.

• 1 January 1994
• journal article
• Published by The Vacuum Society of Japan in SHINKU
• Vol. 37  (10) , 826-832
• https://doi.org/10.3131/jvsj.37.826

Abstract

Keywords

• GROWTH
• LOW TEMPERATURE
• TIO2 RUTILE
• RUTILE FILMS
• REACTIVE SPUTTERING