Field ion microscopy of refractory metal carbides
- 1 April 1968
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine
- Vol. 17 (148) , 865-869
- https://doi.org/10.1080/14786436808223038
Abstract
Certain refractory metal carbides are shown to produce satisfactory feld ion microscope images. In the case of tantalum carbide it is shown that even extensive non-stoichiometry does not significantly degrade image quality. The influence of bond character on field evaporation behaviour is qualitatively explored in an attempt to explain the marked difference in behaviour between TaC and TiC.Keywords
This publication has 3 references indexed in Scilit:
- Field-ion Microscopy of Titanium CarbidePhilosophical Magazine, 1967
- The structure of atomically smooth spherical surfacesJournal of Physics and Chemistry of Solids, 1962
- THE VARIATION OF LATTICE PARAMETER WITH CARBON CONTENT OF TANTALUM CARBIDE1The Journal of Physical Chemistry, 1961