Removal of Fluorocarbon Residues on CF 4 / H 2 Reactive‐Ion‐Etched Silicon Surfaces Using a Hydrogen Plasma
- 1 January 1991
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 138 (1) , 277-284
- https://doi.org/10.1149/1.2085555
Abstract
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