Localized field ion emission using adsorbed hydrogen films on 〈110〉-oriented tungsten field emitters

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Abstract
Growth of microstructures on the surface of thermally annealed 〈110〉-oriented tungsten field emitters is reported to occur in association with local field electron stimulated desorption of physisorbed hydrogen films. Localized electron stimulated desorption of the hydrogen film and the simultaneous local increase of the electron emission to values greater than 104 A/cm2 activate surface rearrangement and the growth of microstructures in the region bounded by the film. Growth of a single 0.02-μm-wide structure by this means and imaging in a low-field (1 V/Å) regime of the field ion microscope provides a stable beam of hydrogen (H+2) ion current of 15 nA in half-angular apertures of 0.016 rad.

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