The bending of silicon wafers by thin polycrystalline silicon film deposition and by film doping using boron diffusion
- 1 July 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 60 (3) , 353-359
- https://doi.org/10.1016/0040-6090(79)90081-6
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- X-ray characterization of stresses and defects in thin films and substratesThin Solid Films, 1976
- Contrast Asymmetries in Lang Topographs of Crystals Strained by Thin FilmsPhysica Status Solidi (b), 1968
- X-Ray Extinction Contrast Topography of Silicon Strained by Thin Surface FilmsJournal of Applied Physics, 1965
- Anwendung der Parallelstrahlmethode im Durchstrahlungsfall zur Prüfung des Kristallinneren mit Röntgen-StrahlenZeitschrift für Naturforschung A, 1958