Low angle electron scattering in thermal resistivity
- 1 October 1975
- journal article
- Published by IOP Publishing in Journal of Physics F: Metal Physics
- Vol. 5 (10) , 1902-1909
- https://doi.org/10.1088/0305-4608/5/10/013
Abstract
Electrical ( rho ) and thermal (W) resistivity measurements in very dilute In alloys between 1K and 4K show a temperature dependence expressed by rho = rho 0+ beta T5 and WT=(WT)0+AT3+BT5. The BT5 term in the thermal resistivity is due to a contribution from a 'diffusion-like process' of electrons over the Fermi surface, as is the one that describes the temperature dependence of the electrical resistivity. This claim is supported by the experimental fact that the Lorenz number defined as L= beta /B coincides with the value given by L= rho 0/(WT)0 which in turn agrees with the free electron value within 15%.Keywords
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