Structure and properties of CVD-BN thick film prepared on carbon steel substrate
- 1 May 1981
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 53 (2) , 418-422
- https://doi.org/10.1016/0022-0248(81)90092-0
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- Chemical vapor deposition of hexagonal boron nitride thick film on ironJournal of Crystal Growth, 1979
- Structure and Properties of Boron Nitride Films Grown by High Temperature Reactive Plasma DepositionJournal of the Electrochemical Society, 1976
- CVD‐BN for Boron Diffusion in Si and Its Application to Si DevicesJournal of the Electrochemical Society, 1975
- Preparation and Properties of Thin Film Boron NitrideJournal of the Electrochemical Society, 1968