The proximity effect in electron beam nanolithography
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 221-224
- https://doi.org/10.1016/0167-9317(91)90082-o
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Nanolithography at 350 KV in a TEMMicroelectronic Engineering, 1989