Growth of Refractory Crystals Using the Induction Plasma Torch
- 1 December 1961
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 32 (12) , 2534-2535
- https://doi.org/10.1063/1.1728345
Abstract
Apparatus is described for growing refractory crystals using the induction plasma torch in a Verneuil‐type geometry. The plasma torch makes possible crystal growth at higher temperatures than can be achieved with flames and in inert or reactive atmospheres. Conditions are given for growth of sapphire, stabilized zirconia, and niobium crystals.This publication has 1 reference indexed in Scilit:
- Induction-Coupled Plasma TorchJournal of Applied Physics, 1961