Deposition of transparent heat-reflecting coatings of metal oxides using reactive planar magnetron sputtering of a metal and/or alloy
- 6 March 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 77 (1-3) , 119-126
- https://doi.org/10.1016/0040-6090(81)90366-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide filmsThin Solid Films, 1979
- Properties of conducting transparent oxide films produced by ion plating onto room-temperature substratesApplied Physics Letters, 1979
- Preparation of Sn-doped In2O3 (ITO) films at low deposition temperatures by ion-beam sputteringApplied Physics Letters, 1979
- Sputter deposition and characterization of Cd2SnO4 filmsThin Solid Films, 1978
- Effect of O2 pressure during deposition on properties of rf-sputtered Sn-doped In2O3 filmsApplied Physics Letters, 1977
- Production and Properties of Transparent Electroconductive Coating on Polyester FilmJapanese Journal of Applied Physics, 1974