Pulsed Laser Deposition Of Amorphous Carbon Films

15 January 1990

proceedings article
Published by SPIE-Intl Soc Optical Eng

Vol. 1146, 48-55
https://doi.org/10.1117/12.962061

Abstract

We have deposited thin amorphous carbon films on various substrate materials by irradiating a high purity (5N) graphite target in vacuum with pulsed light at 248 nm from a KrF excimer laser. The films have been characterized by Raman scattering, AES, SEM and chemical inertness tests. The films deposited on silicon are smooth and partially transparent. The preliminary Raman spectra show no evidence of crystalline grains (diamond or graphite) however the films deposited on silicon and quartz survived etching by a solution of HF:HNO₃ (1:1). We will report on the substrate temperature dependence of laser deposited films and the variation of film quality on substrate material.

Keywords

HAFNIUM
LASERS
CHEMICALS
ETCHING
PULSED LASER DEPOSITION
RAMAN SCATTERING
AMORPHOUS CARBON
CARBON
SILICON
DIAMOND

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