Abstract
A wide variety of semiconductor and metal films have recently been grown, doped, or etched by laser photochemical processes. While still early in its development, laser-driven processing of semiconductor devices appears promising as a supplement to existing processing techniques and particularly in the fabrication of III-V compound and custom devices. A discussion of film growth and etching shows that the laser is capable of performing all of the basic processing steps required in device fabrication without the need for photolithographic techniques. The boundaries of the field are set only by the number of semiconductor and metal-containing compounds having reasonable vapor pressure (~1 torr) at several hundred degrees centigrade or less.

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