A study of electrical conduction in island structure nickel and 80:20 nickel-chromium films
- 1 March 1968
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 1 (5) , 325-342
- https://doi.org/10.1016/0040-6090(68)90023-0
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- The structural and electrical properties of 80:20 NiCr thin filmsThin Solid Films, 1967
- Electrical Conduction through SiO FilmsJournal of Applied Physics, 1966
- The effect of composition on the temperature coefficient of resistance of NiCr filmsBritish Journal of Applied Physics, 1965
- The structure of vacuum condensed Ni-Cr filmsMicroelectronics Reliability, 1964
- Electrical Conduction in Discontinuous Thin Metal FilmsJournal of Applied Physics, 1963
- Electrical Conduction Mechanism in Ultrathin, Evaporated Metal FilmsJournal of Applied Physics, 1962