Penetration of Electrons in Aluminum Oxide Films
- 15 July 1956
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 103 (2) , 292-293
- https://doi.org/10.1103/physrev.103.292
Abstract
The practical range of low-energy electrons in thin films has been measured. Films ranging in thickness from 85 to 5000 A were investigated. Results are in close agreement with the predictions of Bethe and the results obtained by Hoffman for 1000-3000 A films. The practical range-energy relation obtained was found to be , where is expressed in mg/ and in kev.
Keywords
This publication has 10 references indexed in Scilit:
- Penetration of Electrons and Ions in AluminumJournal of Applied Physics, 1956
- Durchlässigkeit von 1000 bis 3000 Å dicken Aluminiumoxydfolien für Elektronen unterhalb 16 keV EnergieThe European Physical Journal A, 1955
- Ranges of Low-Energy Electrons in ProteinNature, 1955
- Preparation and Infrared Properties of Aluminum Oxide Films*Journal of the Optical Society of America, 1955
- Transmission of 0-40 kev Electrons by Thin Films with Application to Beta-Ray SpectroscopyPhysical Review B, 1954
- Range Measurement of Low-Voltage ElectronsPhysical Review B, 1954
- On the Preparation of Hard Oxide Films with Precisely Controlled Thickness on Evaporated Aluminum Mirrors*Journal of the Optical Society of America, 1949
- Ein einfaches Verfahren zur Herstellung strukturloser Trägerschichten aus AluminiumoxydThe Science of Nature, 1947
- Nuclear Physics C. Nuclear Dynamics, ExperimentalReviews of Modern Physics, 1937
- On the Theory of Excitation by Collision with Heavy ParticlesMathematical Proceedings of the Cambridge Philosophical Society, 1931