Tenth micron lithography with a 10 Hz 37.2 nm sodium laser
- 31 August 1988
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 8 (1-2) , 3-11
- https://doi.org/10.1016/0167-9317(88)90003-2
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Comparison of extreme-ultraviolet flux from 106- and 106-μm laser-produced plasma sources for pumping photoionization lasersOptics Letters, 1986
- High -gain inner-shell photoionization laser in Cd vapor pumped by soft-x-ray radiation from a laser-produced plasma sourceOptics Letters, 1983
- Electron temperature versus laser intensity times wavelength squared: a comparison of theory and experimentsNuclear Fusion, 1983
- COMPARISON OF X‐RAY SOURCES FOR EXPOSURE OF PHOTORESISTSAnnals of the New York Academy of Sciences, 1980
- THE FABRICATION OF MULTILAYER X-RAY MIRRORSAnnals of the New York Academy of Sciences, 1980
- Bent Glass OpticsPublished by SPIE-Intl Soc Optical Eng ,1977
- SOME APPROACHES TO VACUUM UV AND X-RAY LASERSApplied Physics Letters, 1967