Anomalous Diffusion of Ultra low Energy Boron Implants in Silicon
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Analysis of low energy boron implants in silicon through SiO2 films: implantation damage and anomalous diffusionMicroelectronics Journal, 1994