Surface cleaning in thin film technology
- 15 August 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 53 (1) , 81-96
- https://doi.org/10.1016/0040-6090(78)90376-0
Abstract
No abstract availableKeywords
This publication has 58 references indexed in Scilit:
- Voids in thin as‐deposited gold films prepared by vapor depositionJournal of Vacuum Science and Technology, 1977
- The effects of sputtering damage on the characteristics of molybdenum-silicon Schottky barrier diodesSolid-State Electronics, 1976
- Preparation and properties of adherent, transparent, conducting Rh filmsJournal of Vacuum Science and Technology, 1976
- Porosity in sputtered platinum filmsJournal of Vacuum Science and Technology, 1974
- Thin film metallization of oxides in microelectronicsThin Solid Films, 1973
- Charge effects in thin film adhesionThin Solid Films, 1972
- Relationship between Substrate Surface Chemistry and Adhesion of Thin FilmsJournal of Vacuum Science and Technology, 1972
- Composite Film Metallizing for CeramicsJournal of the Electrochemical Society, 1970
- Influence of Oxygen on the Adherence of Gold Films to Oxide SubstratesJournal of Applied Physics, 1966
- Interface Formation during Thin Film DepositionJournal of Applied Physics, 1963