Improved measurement method in rotating-analyzer ellipsometry
- 1 July 1984
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America A
- Vol. 1 (7) , 706-710
- https://doi.org/10.1364/josaa.1.000706
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 9 references indexed in Scilit:
- Recent developments in instrumentation in ellipsometrySurface Science, 1980
- A simple Fourier photopolarimeter with rotating polarizer and analyzer for measuring Jones and Mueller matricesOptics Communications, 1978
- High Precision Scanning EllipsometerApplied Optics, 1975
- Effects of component optical activity in data reduction and calibration of rotating-analyzer ellipsometersJournal of the Optical Society of America, 1974
- Optimizing precision of rotating-analyzer ellipsometersJournal of the Optical Society of America, 1974
- Design and Operation of ETA, an Automated EllipsometerIBM Journal of Research and Development, 1973
- Azimuthal Misalignment and Surface Anisotropy as Sources of Error in EllipsometryApplied Optics, 1970
- Measurement of the thickness and refractive index of very thin films and the optical properties of surfaces by ellipsometryJournal of Research of the National Bureau of Standards Section A: Physics and Chemistry, 1963