Angle-variable infrared external reflection spectroscopy in UHV and its application to the observation of SiH vibrations on Si(001) substrates with a buried metal layer
- 1 December 1996
- journal article
- Published by Elsevier in Surface Science
- Vol. 368 (1-3) , 102-107
- https://doi.org/10.1016/s0039-6028(97)80024-6
Abstract
No abstract availableKeywords
This publication has 29 references indexed in Scilit:
- Synchrotron Radiation Irradiation Effects forSiHnon Si(100) Surface in the Synchrotron Radiation Stimulated Si Gas Source Molecular Beam EpitaxyJapanese Journal of Applied Physics, 1995
- Hydrogen in Porous Silicon: Vibrational Analysis of SiH x SpeciesJournal of the Electrochemical Society, 1995
- External reflection infrared spectroscopy at metallic, semiconductor, and nonmetallic substrates. 1. Monolayer filmsThe Journal of Physical Chemistry, 1993
- Infrared reflection-absorption spectroscope using thin film structuresSpectrochimica Acta Part A: Molecular Spectroscopy, 1990
- Infrared reflectance properties of surface thin filmsThe Journal of Physical Chemistry, 1989
- IR absorption from CO molecules adsorbed onto superlatticesSuperlattices and Microstructures, 1987
- Quantitative aspects of infrared external reflection spectroscopy: polymer/glassy carbon interfaceAnalytical Chemistry, 1986
- New Ordered Structure for the H-Saturated Si(100) Surface: The (3×1) PhasePhysical Review Letters, 1985
- Structural interpretation of the vibrational spectra of-Si: H alloysPhysical Review B, 1979
- Electric Fields Produced by the Propagation of Plane Coherent Electromagnetic Radiation in a Stratified MediumJournal of the Optical Society of America, 1968