Diffusion of reactive ion beam etched polymers
- 11 January 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 52 (2) , 101-102
- https://doi.org/10.1063/1.99062
Abstract
The diffusion of deuterated polystyrene (d-PS) in a polystyrene matrix was used to probe the damage to the polymer surface caused by reactive ion beam etching (RIBE). Diffusion was seen to be hindered in a d-PS film treated by RIBE, an immobilization apparently due to crosslinking of the surface monolayer of the polymer sample.Keywords
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