The properties of high-intensity heavy-negative-ion source, NIABNIS

Abstract
The production and destruction of negative ions, which are very important factors for designing high‐intensity heavy‐negative‐ion sources, have been experimentally investigated. For the optimum production of negative ions by sputtering, the control of both the cesium supply and the target temperature is essential. The production probability of carbon negative ions was obtained to be 18.3% at the maximum of sputtered particles. Single‐ and double‐electron detachment cross sections are found in the order of 10−15 and 10−16 cm2 , respectively, in a velocity range of 105 m/s. The heavy‐negative‐ion source NIABNIS, developed by the authors, can deliver continuous high negative‐ion currents of 735 μA for C, 200 μA for C2 , 320 μA for Cu, and 170 μA for Si.

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