Masks for x-ray lithography with a point source stepper

• 1 November 1992
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 10  (6) , 3186-3190
• https://doi.org/10.1116/1.585909

Abstract

Keywords

• POINT SOURCE