Dry etching of III–V semiconductors in CH3I, C2H5I, and C3H7I discharges

• 1 November 1992
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 10  (6) , 2378-2386
• https://doi.org/10.1116/1.586071

Abstract