Model calculations of profiles and dose of high dose ion implants influenced by sputtering
- 1 April 1976
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 134 (1) , 167-172
- https://doi.org/10.1016/0029-554x(76)90138-5
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- The Z1dependence of heavy-ion sputtering yield in copperRadiation Effects, 1972
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Sputtering experiments in the high energy regionNuclear Instruments and Methods, 1961
- Collection and sputtering experiments with noble gas ionsNuclear Instruments and Methods, 1961