D-C Dielectric Breakdown of Amorphous Silicon Dioxide Films at Room Temperature

• 1 January 1968
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 115  (1) , 88
• https://doi.org/10.1149/1.2411029

Abstract

Keywords

• SILICON DIOXIDE
• DIOXIDE FILMS
• BREAKDOWN
• DIELECTRIC
• ROOM TEMPERATURE
• AMORPHOUS SILICON