Influence of process parameter variation on the reflectivity of sputter-deposited W–C multilayer diffraction gratings
- 1 May 1986
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 4 (3) , 641-644
- https://doi.org/10.1116/1.573862
Abstract
Multilayer W–C diffraction gratings with nominal d spacings of 35 Å have been fabricated by magnetron sputter deposition. The peak and integrated reflectivities of these films have been measured with AlKα x rays and compared to theoretical values. The rms surface roughness has been evaluated. The influence of several sputtering-system process parameters on the reflectivities has been investigated.Keywords
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