Implantation temperature effect on polycrystalline silicon by ion shower doping
- 15 December 1993
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 74 (12) , 7114-7117
- https://doi.org/10.1063/1.355026
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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