Microstructure isolation testing using a scanning electron microscope
- 4 June 1990
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 56 (23) , 2310-2312
- https://doi.org/10.1063/1.102927
Abstract
A new form of testing is described that is suitable for verifying isolation in many forms of microstructures. Excess charge is deposited on the microstructures by a scanning electron microscope (SEM) beam. On elements of the microstructures that are isolated, this excess charge induces a voltage contrast that is detected at the same time by the same beam. Isolation to approximately 2×1011 Ω can be verified. The method is simple and fast, requiring only a standard SEM and simple test structures.Keywords
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