Characterizing a surface imaging process in a high-volume DRAM manufacturing production line

1 June 1991

proceedings article
Published by SPIE-Intl Soc Optical Eng

p. 616-627
https://doi.org/10.1117/12.46409

Abstract

The manufacturing of the next generation of DRAMs will require microlithographic capability in the 0.5 micrometers range. Our goal is to develop this capability using g-line optical microlithography; and i- line when g-line fails. To determine if surface-imaging is a viable alternative to extend the practical resolution limit of g-line lithography in a manufacturing environment, we have set up and characterized DESIRE, a surface-imaging process, in a high-volume DRAM manufacturing production line. This characterization study includes: (a) determination of basic lithographic data, (b) measurement of linewidth as the criterion to determine the stability of the process over time, (c) pattern transfer and stability of the resist to dry-etch processes, (d) measurement of any radiation-induced damage taking place during dry- development.

Keywords

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