Chemical structure and physical properties of diamond-like amorphous carbon films prepared by magnetron sputtering

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Abstract
Thin films of amorphous carbon (a–C) and amorphous hydrogenated carbon (a–C:H) were prepared using magnetron sputtering of a graphite target. The chemical structures of the films were characterized using electron energy loss spectroscopy (EELS) and Raman spectroscopy. The mass density, hardness, residual stress, optical band gap, and electrical resistivity were determined, and their relation to the film's chemical structure are discussed. It was found that the graphitic component increases with increasing sputtering power density. This is accompanied by a decrease in the electrical resistivity, optical band gap, mass density, and hardness. Increasing the hydrogen content in the sputtering gas mixture results in decreasing hardness (14 GPa to 3 GPa) and mass density, and increasing optical band gap and electrical resistivity. The variation in the physical properties and chemical structures of these films can be explained in terms of the changes in the volume of sp2-bonded clusters in the a–C films and changes in the termination of the graphitic clusters and sp3-bonded networks by hydrogen in the a–C:H films.