Fabrication of stable hydrogenated amorphous silicon from SiH2Cl2 by ECR-hydrogen-plasma
- 1 September 1994
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 34 (1-4) , 517-523
- https://doi.org/10.1016/0927-0248(94)90080-9
Abstract
No abstract availableKeywords
Funding Information
- New Energy and Industrial Technology Development Organization
- Ministry of Education, Culture, Sports, Science and Technology (0242021)
This publication has 3 references indexed in Scilit:
- Very Stable a-Si:H Prepared by “Chemical Annealing”Japanese Journal of Applied Physics, 1991
- Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance PlasmaJapanese Journal of Applied Physics, 1983
- Reversible conductivity changes in discharge-produced amorphous SiApplied Physics Letters, 1977