Growth effects of In 0.53 Ga 0.47 As on InP structured substrates

Abstract
LPE growth studies of In0.53Ga0.47As on structured InP substrates orientated in the (100) and (111)B planes have been carried out. A reluctance to grow in the [111]A and [111]B directions has been found while nucleation readily occurs on (100) faces and rounded surfaces. Selective growth in etched channels was possible without masking.

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