Investigation of Silicides Obtained by Fe+ Implantation into Silicon
- 16 August 1986
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 96 (2) , 463-468
- https://doi.org/10.1002/pssa.2210960211
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Shock crystallization in amorphous films of dielectricsSurface Science, 1979
- Structural and magnetic properties in FexSi1−x amorphous alloysJournal of Applied Physics, 1978
- Formation of SiO2 Films by Oxygen-Ion BombardmentJapanese Journal of Applied Physics, 1966
- Magnetic Study of Fe3Si and Fe5Si3 by Mössbauer EffectJournal of the Physics Society Japan, 1963