Spatial-phase-locked electron-beam lithography and x-ray lithography for fabricating first-order gratings on rib waveguides
- 1 November 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (6) , 3741-3745
- https://doi.org/10.1116/1.587434