High resolution sputtering using a focused ion beam
- 1 June 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 92 (1-2) , 165-169
- https://doi.org/10.1016/0040-6090(82)90199-7
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Ion-beam sensitivity of polymer resistsJournal of Vacuum Science and Technology, 1981
- Ion beam exposure profiles in PMMA–computer simulationJournal of Vacuum Science and Technology, 1981
- GaAs MESFET fabrication using maskless ion implantationIEEE Electron Device Letters, 1981
- Sensitivity and contrast of some proton‐beam resistsPolymer Engineering & Science, 1980
- High-resolution, ion-beam processes for microstructure fabricationJournal of Vacuum Science and Technology, 1979
- Ion beam exposure characteristics of resistsJournal of Vacuum Science and Technology, 1979
- 400-Å high aspect-ratio lines produced in poylmethyl methacrylate (PMMA) by ion-beam exposureApplied Physics Letters, 1979
- A high-intensity scanning ion probe with submicrometer spot sizeApplied Physics Letters, 1979
- Ion Beam Exposure of Resist MaterialsJournal of the Electrochemical Society, 1979
- Ion−beam etchingJournal of Vacuum Science and Technology, 1975