Sputtering target for production of CoNiCr/Cr sputtered hard disk

1 July 1987

journal article
Published by American Vacuum Society in Journal of Vacuum Science & Technology A

Vol. 5 (4) , 1971-1974
https://doi.org/10.1116/1.574895

Abstract

We have developed a new target composed of Co–20(at. %)Ni–10(at. %)Cr for preparing the CoNiCr hard disk by the sputtering process. The target shows a higher utilization efficiency of more than 20%, which is about twice that of a conventional Co–30(at. %)Ni–7.5(at. %)Cr target. The new target also shows stable discharge characteristics during a long sputtering process. These results are due to low magnetic permeability of target materials. We named this new target an ‘‘MT target.’’ Hard disks prepared with the Co–20Ni–10Cr MT target show the equivalent magnetic properties, recording/reproducing characteristics, and weatherproof properties as hard disks prepared with the Co–30Ni–7.5Cr target.

Keywords

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