Focused ion beam secondary ion mass spectrometry: Ion images and end-point detection

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Abstract
A secondary ion mass spectrometer (SIMS) has been added to a liquid metal source instrument which was designed as a micromachining apparatus. The SIMS performance rivals any reports to date on similar devices, even though no compromises were made with the primary function of the apparatus. End-point detection for ion milling allows depth control within a few hundred angstroms, on micron sized raster fields. A sensitivity of 4×10 5 cps/nA is routinely measured on 52Cr+ signals; similar count rates are also obtained from Al. Ion images on Cr or Al with sub-micron resolution with a 25-μm field are obtained in as little as 10 s collection time. Features as small as 0.3 μm can be defined by the secondary ion imaging, with the removal of only a few monolayers of material.

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