Magnetostriction constants of sputtered FeTaN single crystal thin films
- 1 January 1996
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 32 (5) , 3542-3544
- https://doi.org/10.1109/20.538684
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Magnetostriction and thin-film stress in high magnetization magnetically soft FeTaN thin filmsJournal of Applied Physics, 1996
- Measurement of the crystalline anisotropy in sputtered single-crystal FeTaN thin filmsJournal of Applied Physics, 1996
- The effect of nitrogen on soft magnetism in FeTaN filmsIEEE Transactions on Magnetics, 1995
- Relationship between microstructure and magnetic properties in soft Fe-Ta-N filmsIEEE Transactions on Magnetics, 1995
- Magnetostriction and internal stresses in thin films: the cantilever method revisitedJournal of Magnetism and Magnetic Materials, 1994
- Theoretical study of magnetostriction in FeTaN thin filmsJournal of Applied Physics, 1994
- A new high-precision optical technique to measure magnetostriction of a thin magnetic film deposited on a substrateIEEE Transactions on Magnetics, 1989
- The measurement of magnetostriction in ferromagnetic thin filmsIEEE Transactions on Magnetics, 1976
- Magnetostriction and Magnetomechanical EffectsReports on Progress in Physics, 1955