Thermodynamic approach to the CHO deposition diagram in the diamond chemical vapour deposition process
- 1 January 1994
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 3 (1-2) , 163-167
- https://doi.org/10.1016/0925-9635(94)90051-5
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- The deposition of diamond films via the oxyacetylene torch: Experimental results and thermodynamic predictionsJournal of Crystal Growth, 1992
- Thermodynamics and kinetics for nucleation of diamond in the chemical vapor deposition processDiamond and Related Materials, 1992
- Application of thermodynamics to the examination of the diamond CVD process from hydrocarbon-hydrogen mixturesJournal of Crystal Growth, 1989
- Thermodynamic analysis of the chemical vapor deposition of diamond filmsSolid State Communications, 1989
- Diamond—Ceramic Coating of the FutureJournal of the American Ceramic Society, 1989
- Growth of diamond thin films by dc plasma chemical vapor depositionApplied Physics Letters, 1987
- Growth of diamond thin films by electron-assisted chemical vapour deposition and their characterizationThin Solid Films, 1986
- Diamond synthesis from gas phase in microwave plasmaJournal of Crystal Growth, 1983
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982
- Vapor Deposition of Diamond Particles from MethaneJapanese Journal of Applied Physics, 1982